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Growth and characterization of thin films of ZnO by Atomic Layer Epitaxy
|Aleksandra M. Wojcik 1,2, Krzysztof Kopalko 1, A. Khachapuridze , Andrzej Szczerbakow 1, Marek Godlewski 1,2, Elżbieta Lusakowska 1, Wojciech Paszkowicz 1, Jaroslaw Domagala 1|
1. Polish Academy of Sciences, Institute of Physics, al. Lotników 32/46, Warszawa 02-668, Poland
We report growth of monocrystalline and polycrystalline thin films of ZnO by atomic layer epitaxy (ALE), often referred to as atomic layer deposition (ALD). ZnO films were grown on several substrates. Monocrystalline films were obtained using GaN/Al2O3 as a substrate, whereas use of sapphire, silicon, GaAs or lime glass resulted in either 3D growth mode or in polycrystalline films showing preferential orientation of the c axis. Crystalline properties of the films are studied with atomic force microscopy and X-ray diffraction techniques. Monocrystalline ZnO films show the structural quality limited by that of the GaN template and very flat surfaces, with roughness below 1 nm RMS. Polycrystalline films are often rougher, showing granular micro-structure. Influence of growth conditions, precursors used and post-growth annealing will be discussed.
Presentation: oral at E-MRS Fall Meeting 2004, Symposium F, by Krzysztof Kopalko
See On-line Journal of E-MRS Fall Meeting 2004
Submitted: 2004-05-06 13:24 Revised: 2013-02-28 15:04