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In-vacancies in Si-doped InN |
Christian Rauch 1, Floris Reurings 1, Filip Tuomisto 1, Tim Veal 2, Chris F. McConville 2, Hai Lu 3, William J. Schaff 3, Chad S. Gallinat 4, Gregor Koblmueller 4, James S. Speck 4 |
1. Helsinki University of Technology, Department of Applied Physics (TKK), POB 1100, Otakaari 1 M, Espoo 02015-TKK, Finland |
Abstract |
Despite of remarkable improvements in crystal quality during the last years, as-grown InN still exhibits a strong n-type tendency and considerably high defect concentrations [1]. Concerning native defects, recent calculations [2] predict In-vacancies to be the most abundant defect type in n-type InN and possess the tendency for forming complexes with other intrinsic defects or impurities [3], which raises the question of their impact on the materials properties. In this contribution we present results obtained with positron annihilation spectroscopy in MBE-grown Si-doped InN with electron concentrations from 1 x 1018 cm-3 to 6.6 x 1020 cm-3. Temperature dependent Doppler Broadening measurements show In-vacancies in concentrations from 2 x 1016 cm-3 to 7 x 1017 cm-3 which increase with increasing electron concentration in the material. These values are remarkably higher than what can be estimated from theoretically predicted formation energies of In-vacancies in InN based on experimentally determined Fermi levels in the investigated samples [4]. Additionally, a strong inhomogeneity of the defect distribution with an increasing vacancy concentration towards the layer/substrate-interface can be observed. These results suggest that the formation energy of In-vacancies is locally reduced in the vicinity of extended defects, which are especially abundant in the interface area - possibly through the formation of defect complexes. From the observed threshold for the formation of In-vacancies, which is seen by a comparison with earlier results in He-irradiated InN [5], it can be deduced that in spite of their still relatively low absolute concentrations In-vacancies play an important role in reducing the electron mobility in the material. [1] B. Monemar et al., Phys. Stat. Sol. B 244, 1759-1768 (2007) [2] C. Stampfl et al., Phys. Rev. B 61, R7846-R7849 (2000) [3] X. M. Duan et al., Phys. Rev. B 79, 035207 (2009) [4] P. D. C. King et al., Phys. Rev. B 77, 045316 (2008) [5] F. Tuomisto et al., Phys. Rev. B 75, 193201 (2007) |
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Presentation: Oral at E-MRS Fall Meeting 2009, Symposium A, by Christian RauchSee On-line Journal of E-MRS Fall Meeting 2009 Submitted: 2009-05-11 15:53 Revised: 2009-06-07 00:48 |