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Spectroscopic Ellipsometry and Raman Studies on Sputtered TiO2 Thin Films
|Bojan Karunagaran , Kyunghae Kim , Suresh Kumar Dhungel , Jinsu Yoo , Devanesan Mangalaraj , Junsin Yi|
Sungkyunkwan University, School of Information and Communication Engineering, 300 Chunchun-dong, Jangan-gu, Suwon 440746, Korea, South
Titanium dioxide films have been deposited using DC magnetron sputtering onto well-cleaned p-type silicon substrates at the ambient temperature at an oxygen partial pressure of 7x10-5 mbar and total sputtering pressure of 1x10-3 mbar. The compositions of the films were found to be stoichiometric (O/Ti=2.07) as analyzed by Auger Electron Spectroscopy (AES). The rms roughness of the film is evaluated as 4.8 nm using ex-situ atomic force microscopy.
Presentation: oral at E-MRS Fall Meeting 2004, Symposium G, by Bojan Karunagaran
See On-line Journal of E-MRS Fall Meeting 2004
Submitted: 2004-04-30 08:30 Revised: 2009-06-08 12:55