Thin films of organic-inorganic hybrid materials where grown by ALD, using TMA (TMA = trimethylaluminium) and different types of carboxylic acids as precursors. In-situ analysis by quarts crystal microbalance was used to establish growth parameters for the different systems. Measurements of growth rate as function of temperature show that most systems do posess ALD-windows. X-ray diffraction studies of the as-deposited films indicate that most films are of an amorphous character, which is also supported by very low surface roughness as measured by atomic force microscopy. The growth rates of these hybrid materials are high when compared to traditional materials deposited by ALD, and growth rates as high as 4.32 nm/cycle has been found for the TMA and pimelic acid system by X-ray reflectivity, Fig. 1. As-deposited films were investigated by Fourier Transform Infrared Spectroscopy (FT-IR).

Fig.1: Growth rates of hybrid films deposited with linear carboxylic acids and TMA.

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