The atomic layer deposition (ALD) technique has been used to deposit thin films of molecular type organic- inorganic hybrid materials. The growth has been exemplified by construction of thin films of Alq₃, Znq₃ and Tiq₄ (q = 8-hydroxyquinoline), as well as growth of aluminium benzoate. Traditionally the ALD technique has been used for deposition of materials that form three dimensional networks. However, we have now also demonstrated growth of molecular type of compounds by the ALD technique. The Alq₃ and Znq₂ material are potential light emitting materials in OLED structures.

Fig. 1. In situ measurement of mass change by quarts crystal microbalance during deposition of titanium tetra 8-hydroxyquinoline at a reactor temperature of 85 °C.

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1. Using carboxylic acids to grow organic-inorganic hybrid materials by ALD
2. Growth of 3D core-shell nanostructures by ALD
3. In situ heat analysis of ALD growth by usage of thermopile