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In situ heat analysis of ALD growth by usage of thermopile |
Ola Nilsen , Helmer Fjellvåg , Arne Kjekshus |
Department of Chemistry and Centre for Materials Science and Nanotechnology (UIO), Oslo 0315, Norway |
Abstract |
We have constructed a thermopile capable of detecting the heat evolved in each reaction taking part in the cycles of atomic layer deposition growth. The sensor is tested on the growth of aluminiumoxide from trimethylaluminium (TMA) and water. This show that both half reactions of the TMA and water process are exothermic while excess reactants apply a cooling effect on the substrate. The outcome for analysis of similar processes will also be presented. The thermopile may be used to asses whether reactions are taking place, to indicate the necessary pulsing parameters for growth, and to provide important insight into the reaction process.
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Presentation: Poster at E-MRS Fall Meeting 2007, Symposium C, by Ola NilsenSee On-line Journal of E-MRS Fall Meeting 2007 Submitted: 2007-05-14 15:06 Revised: 2009-06-07 00:44 |