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Co-doped TiO2 films grown on Al2O3 (0001) by laser ablation

Nicoleta Popovici 1Olinda Conde 1William R. Branford 2,3Lesley F. Cohen 2

1. University of Lisbon, Faculty of Sciences (FCUL), Campo Grande, Ed. C8, Lisboa 1749-016, Portugal
2. Imperial College, Blackett Laboratory, Prince Consort Road, London SW72AZ, United Kingdom
3. University College London, Department of Chemistry (UCL), Gordon Street, London WC1HOAJ, United Kingdom

Abstract

Of the various groups of semiconductors, the dilute magnetic oxide semiconductors appear to be one of the most promising routes to high Curie temperature ferromagnetic semiconductors. Indeed, both the anatase and rutile structure-types of TiO2 doped with Co have been found to be ferromagnetic at room temperature [1, 2].

In this paper we report on Co-doped TiO2 thin films that were prepared by Pulsed Laser Deposition (PLD) on sapphire substrates. Ablation was carried out in argon atmosphere at total pressure between 7 and 50 Pa, for different substrate temperatures up to 400 ÂșC, by using polycrystalline targets of TiO2 rutile with a few mol% of Co2O3. Some of the samples were prepared by adding a small amount of hydrogen to the gas phase during growth.

The effect of varying the laser fluence, hydrogen and argon flux, total pressure and growth temperature on the structure and physical properties of the films was systematically studied. Characterisation of the as-deposited films was performed using various structural, compositional, optical and magnetic characterisation methods.

1. Y. Matsumoto, M. Murakami, T. Shono, T. Hasegawa, T. Fukumura, K. Kawasaki, P. Ahmet, T. Chikyow, S.Y. Koshihara, H. Koinuma, Science 291 (2001) 854.

2. Y. Matsumoto, R. Takahashi, M. Murakami, T. Koida, X.-J. Fan, T. Hasegawa, T. Fukumura, M. Kawasaki, S.-Y. Koshihara, H. Koinuma, Jpn. J. Appl. Phys. 40 (2001) L1204.

 

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Related papers

Presentation: Poster at E-MRS Fall Meeting 2006, Symposium E, by Nicoleta Popovici
See On-line Journal of E-MRS Fall Meeting 2006

Submitted: 2006-05-12 12:11
Revised:   2009-06-07 00:44