A number of technologically important properties of polymeric materials are controlled by their surface chemistry and morphology. For polymer blends , the equilibrium composition of the surfaces is different from the bulk composition.

The present work is aimed to form PS(polystyrene) /PMMA (polymethylmethacrylate) blends polymeric layers (25-75 weight % concentration) based on toluene solutions of 0.5 weight % concentration and characterize these layers on various substrates ( SiO₂ glass, Si crystalline substrate) exposed to plasma and chemical processing.

The dependence of the processes of formation and morphology of PS/ PMMA blend films on solution concentration, type and conditions of substrate processing was studied by such methods as ellipsometry, laser light scattering, scanning electron microscopy (SEM), electronic spectroscopy for chemical analysis (ESCA) and atomic force microscopy (AFM).

It is shown, that as a result of sorption processes of interaction between polymer macromolecules and substrate surface, thin polymeric layers with a structure determined by the substrate properties, solution concentration and temperature are formed. It is demonstrated that due to interaction of growing films with the substrate, morphology of thin film have a tendency to nanostructurisation, and periodic nanostructures can be formed.

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