Cu(II) and Ag(I) aliphatic perfluorinated carboxylates: [Cu(OOCC6F13)] and [Ag2(RCOO)2(PEt3)2] where R = CF3, C2F5, C6F13, were characterized by MS EI, temperature-variable IR and TGA/IR methods as a new silver and copper CVD precursors. Gas phase and the thermal decomposition reaction mechanism was proposed which was used for determination of CVD parameters. Hot - wall CVD experiments were performed in the low-pressure horizontal reactor using argon as the carrier gas. Obtained silver and copper films (60 -120 nm) were characterized by XPS, XRD, SEM and adhesion tests.

Acknowledgements: Authors thank the Polish State Committee for Scientific Research grant PB 4T08C 039 23 for financial support.

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1. Influence of structural and thermal properties of new CVD precursors of copper and silver on the quality and morphology of nanometallic layers.
2. Cu(I) complexes with perfluorinated carboxylates as potential CVD precursors