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Influence of structural and thermal properties of new CVD precursors of copper and silver on the quality and morphology of nanometallic layers. |
Edward Szłyk , Piotr Piszczek , Iwona Szymańska , Robert Szczesny |
Nicolaus Copernicus University, Faculty of Chemistry (WChUMk), Gagarina 7, Toruń 87-100, Poland |
Abstract |
New Cu(I), Ag(I)and Au(I) complexes with silyllated and perfluorinated carboxylates [RCOOMPR3], and tertiary phosphines PR3; R= Me, Et and diphosphines were characterized by 13C, 19F, 31P NMR, IR, MS spectroscopy and thermal properties studied. Thermal decomposition of complexes proceeds in a multistage processes, which yields metallic final product detected by XRD. Results of MS studies and thermal analysis exhibited were used to propose the decomposition mechnism. TGA/IR analysis of gases evolved during decomposition revealed metallated particles in gases, which decide about the transport mechnism in CVD processes. Thermal decomposition of copper complexes, in nitrogen and air yields metallic silver and a mixture of Cu2O and Cu2P2O7. Chemical Vapour Deposition in hot wall reactor precursors based on studied carboxylates yields nanometric metallic layers. Therefore studied complexes can be treated as a new class of silver, copper and gold precursors. The morphology and composition of the nanolayers were characterised with XRF, XRD, XPS, SEM, STEM and relations between thicknes of the metallic layer and type of precursor were discussed.
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Presentation: oral at E-MRS Fall Meeting 2004, Symposium I, by Edward SzłykSee On-line Journal of E-MRS Fall Meeting 2004 Submitted: 2004-04-29 17:56 Revised: 2009-06-08 12:55 |