Zinc oxide transparent conductive thin films with different thickness were grown by dc magnetron sputtering technique at different growth temperatures onto silicon and Corning glass substrates. X-ray diffraction characterization showed that all the ZnO films are polycrystalline, highly textured with the c axis perpendicular to the substrate surface. The dependence of their optical and electrical properties on the thickness and the growth temperature was investigated. In all cases, the films were found to be highly transparent in the visible wavelength region with an average transmittance of 90%, with a fall-off for wavelengths shorter than 380 nm, characteristics of high quality ZnO films. The position and the shape of the absorption edge observed for wavelengths below 380 nm were found depending on the film thickness and growth temperature. Moreover, an additional absorption band centred near 360 nm was clearly recorded, for all growth temperatures and thicknesses larger than 40 nm.  Although a similar absorption band attributed to excitonic resonances as those related to the exciton/LO phonons has been reported by other researchers, this study focuses on a coherent study of dc magnetron sputtering growth parameters effect on the position and intensity of this absorption local.

• Legal notice:
  

  Copyright (c) Pielaszek Research, all rights reserved.
  The above materials, including auxiliary resources, are subject to Publisher's copyright and the Author(s) intellectual rights. Without limiting Author(s) rights under respective Copyright Transfer Agreement, no part of the above documents may be reproduced without the express written permission of Pielaszek Research, the Publisher. Express permission from the Author(s) is required to use the above materials for academic purposes, such as lectures or scientific presentations.
  In every case, proper references including Author(s) name(s) and URL of this webpage: https://science24.com/paper/15956 must be provided.

1. Ultra Sensitive Metal Oxide Gas Sensing Elements
2. Direct current magnetron sputtering deposition parameters effect on the properties of Silicon doped Aluminum Zinc Oxide thin films
3. Comparable study of ZnInO & ZnN as channel layers for transparent transistors
4. Nanostructured metal oxide thin films for gas sensors