Charaterization of Co-Cu thin films obtained by vapor deposition

Gabriel C. Prodan 1Victor CIUPINA 1Madalina D. Prodan 1Iuliana M. Oancea 1Cristian Lungu 2Ion Mustata 2Nicolae Zaroschi 2Eugeniu Vasile 3

1. "OVIDIUS" University, Mamaia 124, Constanta 8700, Romania
2. National Institute for Lasers, Plasma and Radiation Physics (NILPRP), Atomistilor Str.111, Bucharest R-76900, Romania
3. METAV-CD SA, CA Rosetti Nr 31 Sect. 2, Bucharest 70000, Romania


CoCu thin films are grown by vapor deposition method. As a substrate we use three kinds of materials: large salt monocrystal, metallic, glass and mica slides. The grain size of thin films was measured from TEM images taken with Philips CM120ST microscope. The measured data was fitted assuming a lognormal distribution and result an average size less than 10 nm. The structural properties of films were carried out by means of SAED and HRTEM. SAED pattern confirm cubic structure of nanocrystals and HRTEM images are used for evaluate uniformity of thin films and investigate defects. Fast Fourier transform was used to measure interplanar distance and for improvement of HRTEM image by applying blob type filter and recalculate image without noise. The films are grown using a different substrate. Finally we studies influence of substrate nature in structural properties of film. In other words, we investigate morphology, crystalographic information and defects from thin films deposited to three kind of substrate: glass, metallic and salt (or amorphous, conducting and nonconducting substrate).

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Presentation: Poster at E-MRS Fall Meeting 2007, Symposium J, by Iuliana M. Oancea
See On-line Journal of E-MRS Fall Meeting 2007

Submitted: 2007-05-14 17:43
Revised:   2009-06-07 00:44
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