X-ray reflectivity (XRR) is a unique technique for thin film analysis providing information on thickness, density, and roughness. Indeed, XRR is becoming more and more popular in the characterization of both crystalline and amorphous layered samples.

This technique starts now to be applied in several industrial fields, involving thin film deposition and/or control, but the lacking of good manual practice and standard reference samples makes it hard to norm for metrology.

The VAMAS project “X-ray reflectivity measurements for evaluation of thin films and multilayers” has the goal to assess the accuracy and precision of thickness, density and roughness as determined by XRR measurements and simulations. Preliminary results are encouraging and reference samples are going to be evaluated by the laboratories participating to the project. The goal of this work is to show and discuss the results of the round-robin process involving for the first time 20 laboratory around the world and to show that XRR is a mature technique for nanometrology.

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