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Sol-gel derived silica particles doped with metals

Beata Borak ,  Anna Łukowiak ,  Agnieszka Baszczuk ,  Marek Jasiorski 

Wroclaw University of Technology, Institute of Materials Science and Applied Mechanics (PWr - IMMT), Smoluchowskiego 25, Wrocław 50-370, Poland

Abstract
Chemical modification of the silica surface by thiol groups allows to obtain functionalized silica materials. It has been observed that the presence of thiol groups improves the adsorption of several metal ions to the silica [1]. Therefore, silica can effectively anchor metal complexes and metal ions. SiO2 particles, modified in this way, could be used in order to explore some of practical applications such as ion exchange, preconcentrations of metals from dilute solutions, catalysis of enzymatic reactions and metal-supported reactions [2].

The silica particles with different size (400-600 nm or less) and modified with thiol groups have been obtained by the sol-gel method. As a silica precursors, tetraethoxysilane (TEOS), 3-mercaptopropyltrimethoxysilane (MPTMS) and 3-mercaptopropyltriethoxysilane (MPTES) have been used. Gold, silver, platinium or other metal ions have been doped to colloidal solution of SiO2 particles and then, they have been reduced. The silica particles doped with metallic elements have been obtained and characterized by scanning and transmission electron microscopy (SEM and TEM), EDAX and IR spectroscopy.

Keywords: silica particles, metallic elements, sol-gel, thiol group

[1] G. Hernández, R. Rodríguez, J. Non-Cryst. Solids, 246 (1999) 209-215.
[2] A.R. Cestari, C.Airoldi, J. Colloid Interface Sci., 195 (1997) 338-342.

 

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Presentation: Poster at E-MRS Fall Meeting 2007, Symposium A, by Anna Łukowiak
See On-line Journal of E-MRS Fall Meeting 2007

Submitted: 2007-05-14 13:52
Revised:   2009-06-07 00:44