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Comparison of current-voltage characteristics between AFM modification and ICP etching in fabrication method of a single-channel superconducting flux flow transistor

Seokcheol Ko 1Seong-Jong Kim 2Byoung-Sung Han 3

1. Jeonnam Regional Innovation Agency (JINA), 1000 Namak-Ri Samhyang-Myun, Muan-Gun Jeonnam 534-700, Korea, South
2. Mokpo Maritime University, Chukkyo Dong, Mokpo 530-729, Korea, South
3. Division of Electronics and Information Engineering, Chonbuk National University, 664-14 Dukjin-Dong 1Ga, Jeonju 561-756, Korea, South

Abstract

In order to develop superconducting flux flow transistors (SFFTs), we propose a model to describe the current-voltage characteristics of fabricated devices by considering the Biot-Savart’s law. A single-channel SFFTs were successfully fabricated using an atomic force microscope (AFM) modification method and inductively coupled plasma (ICP) etching method in order to compare to the current-voltage characteristics. The measured and calculated values including flow voltage, transresistance and current gain are discussed in relation to the vortices flow in a single-channel SFFT. The predictions agree well with measured results.

 

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Related papers

Presentation: Poster at E-MRS Fall Meeting 2007, Symposium J, by Seokcheol Ko
See On-line Journal of E-MRS Fall Meeting 2007

Submitted: 2007-05-01 16:26
Revised:   2009-06-07 00:44