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SnO2 films deposited by spray pyrolysis: Intensity of XRD as a parameter for structural characterization |
Ghenadii Korotcenkov 1, Vladimir Brinzari 1, Johannes Schwank 2, Valeriu Blaja 1 |
1. Technical University of Moldova (TUM), Bld. Stefan cel Mare, 168, Chisinau 2004, Moldova |
Abstract |
The study of the influence of additives, used for gas sensing and magnetic properties optimization, on structural properties of SnO2 films, deposited by spray pyrolysis method, was the main goal of research, discussed in this report. Films had thickness from 40 to 400 nm. Cu, Fe, Co, or Ni (0-16 at. %) were used as doping elements. For structural analysis of tested films we used XRD, SEM, and AFM techniques. The change of such parameters as film morphology, grain size, texture, and intensity of X-ray diffraction peaks were controlled. Annealing at 850-1000 oC was used for estimation thermal stability of film structure. It was established that tin oxide doping by Fe, Co, Ni, and Cu promoted the change of film morphology. However the decrease of grain size estimated on the base of XRD data was not big. On the base of obtained results it was concluded that the presence of big contents of fine dispersion phase, which does not provide reflexes in XRD patterns, make us to be careful with any quantitative evaluations, made on the base of XRD data, because in this case we obtain information mainly about grains given contribution in XRD patterns, first of all about crystallites incipient at initial growth stage and grown through the whole of film thickness. It was shown that at certain conditions, connected with keeping measurement conditions invariable, the intensity of X-ray diffraction peaks can be considered as a certain parameter, characterizing the crystallinity of studied material. The smaller intensity of X-ray diffraction peaks at the same film’s thickness is, the worse is the crystallinity, i.e. the bigger is the contents of fine dispersion amorphous-like phase in studied film. It was found that the contents of fine dispersion amorphous-like phase in doped films is increased in the line SnO2:Ni, SnO2:Fe, SnO2:Co, SnO2:Cu. It was shown that thermal unstability of SnO2 film structure in temperature range 600-800 oC is connected with the presence of this phase. |
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Presentation: Poster at E-MRS Fall Meeting 2007, Symposium H, by Ghenadii KorotcenkovSee On-line Journal of E-MRS Fall Meeting 2007 Submitted: 2007-04-02 12:09 Revised: 2009-06-07 00:44 |