STRUCTURAL STABILITY OF In2O3 FILMS DEPOSITED BY SPRAY PYROLYSIS, G.Korotcenkov1, V.Brinzari1, M.Ivanov1, A.Cornet2, A.Cirera2, J.Morante2, 1Technical University of Moldova, Chisinau, Moldova, 2University of Barcelona, Barcelona, Spain
The results of analysis of In2O3 film properties stability during thermal annealing in the temperature range from 500oC to 1100oC are presented in this report. In2O3 films used for gas sensor applications were deposited by spray pyrolysis from InCl3-water solution. The change of parameters such as film morphology; grain size; texture; intensity of catodoluminescence, and Raman scattering were controlled. For structural analysis we used XRD, SEM, and AFM techniques.
It was determined that the change of In2O3 film structure during thermal treatment in oxygen containing atmosphere goes through the following 4 standard stages of structure transformation of polycrystalline materials: the stage of structural stability of the film (25-500oC); the stage of coalescence of grains forming agglomerates (500-700oC); the stage of local structural reconstruction (700-1000oC); and the stage of global (comprehensive) structural reconstruction (>1000oC). The influence of grain size (10-60 nm), film thickness (20- 400 nm), and deposition parameters (Tpyr= 390-520oC) on structural stability of In2O3 films is discussed as well. Besides we established the following regularities: thin films have better structure stability; grain coalescence is accompanied by recrystallization; grain growth during thermal annealing at T(an)> 700 oC does not obey the law t{1/2}; high temperature annealing at T(an)> 1000 oC gives possibility to form In2O3 crystallites with flat surface planes, sufficient for conducting experiments connected with STM method using.

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