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In situ heat analysis of ALD growth by usage of thermopile

Ola Nilsen ,  Helmer FjellvÃ¥g ,  Arne Kjekshus 

Department of Chemistry and Centre for Materials Science and Nanotechnology (UIO), Oslo 0315, Norway

Abstract

We have constructed a thermopile capable of detecting the heat evolved in each reaction taking part in the cycles of atomic layer deposition growth. The sensor is tested on the growth of aluminiumoxide from trimethylaluminium (TMA) and water. This show that both half reactions of the TMA and water process are exothermic while excess reactants apply a cooling effect on the substrate. The outcome for analysis of similar processes will also be presented. The thermopile may be used to asses whether reactions are taking place, to indicate the necessary pulsing parameters for growth, and to provide important insight into the reaction process.


Fig. 1: The evolution of heat as measured by a thermopile during alterations of TMA flow for the pulsing sequence: 5s H2O, 2s purge, 3s TMA, 1s purge. The flow is increased gradually on going from the bottom to the upper line.

 

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Related papers

Presentation: Poster at E-MRS Fall Meeting 2007, Symposium C, by Ola Nilsen
See On-line Journal of E-MRS Fall Meeting 2007

Submitted: 2007-05-14 15:06
Revised:   2009-06-07 00:44