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Molecular organic - inorganic hybrid materials by atomic layer deposition

Ola Nilsen ,  Heidi Nielsen ,  Karina B. Klepper ,  Helmer Fjellvåg 

Department of Chemistry and Centre for Materials Science and Nanotechnology (UIO), Oslo 0315, Norway

Abstract

The atomic layer deposition (ALD) technique has been used to deposit thin films of molecular type organic- inorganic hybrid materials. The growth has been exemplified by construction of thin films of Alq3, Znq3 and Tiq4 (q = 8-hydroxyquinoline), as well as growth of aluminium benzoate. Traditionally the ALD technique has been used for deposition of materials that form three dimensional networks. However, we have now also demonstrated growth of molecular type of compounds by the ALD technique. The Alq3 and Znq2 material are potential light emitting materials in OLED structures.

Fig. 1. In situ measurement of mass change by quarts crystal microbalance during deposition of titanium tetra 8-hydroxyquinoline at a reactor temperature of 85 °C.

 

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Related papers

Presentation: Oral at E-MRS Fall Meeting 2007, Symposium C, by Ola Nilsen
See On-line Journal of E-MRS Fall Meeting 2007

Submitted: 2007-05-14 14:55
Revised:   2009-06-07 00:44