Symposium A

Welcome

The small band gap energy, together with the small effective mass, the large electron mobility and high saturation velocities accompanied by the very high resistance to radiation damage of InN have the potential to lead to a variety of device applications, including high-efficiency multi-junction solar cells, high speed transistors, and light emitters the visible to near-infrared spectral region. Furthermore, the high electron concentrations in the surface accumulation layer can be exploited for gas, chemical and biological sensors and for generation of THz radiation. This symposium covers the most recent developments related to growth and characterization of InN materials and its alloys with GaN and AIN as well as InN heterostructures and device applications.

One of the main materials development challenges is the control of the free electron density in InN and In-rich alloys. Currently the lowest electron carrier densities that have been obtained for thick MBE-grown InN layers are in the mid-10 ¹⁷ cm ^-3 range with mobilities around 2500 cm ²/Vs. Most often, however, typical electron densities in InN are in the mid-10 ¹⁸ cm ^-3 range, which are obtained on MBE grown films with a thickness of a few hundred nanometres. Similarly, the best MOCVD-grown InN layers exhibit electron mobilities around 1000 cm ²/Vs and carrier densities in excess of 10 ¹⁸ cm ^-3.

A related critical issue for the growth of InN and In-rich alloys is the large lattice and thermal mismatch with the available substrates (sapphire, Si, GaAs, SiC) or even bulk GaN. Optimized nucleation techniques and the application of epitaxial lateral overgrowth methods have enabled the realization of GaN layers with dislocation densities in the low 10 ⁶ cm ^-2 range and the fabrication of LDs (laser diodes) with lifetimes of 10000 hours. Suitable growth methods to reduce the threading dislocation densities in InN materials have to be developed in order to improve the crystalline quality of the InN epitaxial layers for the fabrication of high efficiency devices, like solar cells or light emitters.

Topics do be covered by the symposium include:

- p-type doping of InN and In-rich nitrides

- Dislocation reduction in heteroepitaxy

- Reduction of free electron concentrations

- Radiation damage, point defects & doping

- Different growth approaches: MBE, MOCVD, HVPE, ELO

- InN quantum wells and dots

- InN surfaces and heterostructure interfaces

- Growth of In(Al)N alloys

- InN based devices (e.g. HEMTs, diodes, solar cells)

Programme

The Symposium A and RAINBOW workshop TIMETABLE is available on pdf format here

Confirmed invited speakers:

• Friedhelm Bechstedt, Friedrich-Schiller-Universität, Germany: "Spectral properties of InN and related compounds from first principles"
• Arnab Bhattacharya, Tata Institute of Fundamental Research, Mumbai, India: "MOVPE growth and characterization of InN and related heterostructures" 
• Olivier Briot, Université Montpellier II / CNRS, France: " Recent advances in the MOVPE growth of Indium Nitride" 
• Marie-Antoinette di Forte-Poisson, Alcatel Thales III-V lab, France: "LPMOCVD growth of InAlN/GaN HEMT heterostructures. Comparison of composite SiCopSiC and bulk SiC substrates for HEMT device applications"
• Izabela Gorczyza / Tadeusz Suski, Institute of High Pressure Physics “Unipress”, Poland: "In-segregation induced anomalous behavior of band gap and its pressure coefficient in InAlN and InGaN. Theory and Experiment"
• Takashi Inushima, Tokai University, Japan: "Meissner effect of superconducting InN"
• Akihiko Kikuchi, Sophia University, Japan: "InGaN/GaN nanocolumn LEDs and selective area growth of GaN nano-crystals by rf-plasma assisted molecular beam epitaxy"
• Hadis Morkoç, Virginia Commonwealth University, USA: "New Twists in LEDs and HFETs based on Nitride Semiconductors"
• Miguel Sanchez-Garcia, Universidad Politécnica de Madrid, Spain: "MBE growth and characterization of InN-based layers and nanostructures for infrared applications"
• Tatiana Shubina, Ioffe Institute, Russia: "InN/In nanocomposites: plasmonic effects and optical properties"
• Jim Speck, University of California, Santa Barbara, USA: "Progress in MBE growth of InN"
• Chris Van de Walle, University of California, Santa Barbara, USA: "Sources of doping for InN bulk and surfaces"
• Tim Veal, University of Warwick, UK: "Interface, bulk and surface electronic properties of InN"
• Wladek Walukiewicz, Lawrence Berkeley National Laboratory, USA: "Applications of group III-nitride alloys for multijunction solar cells"
• Christian Wetzel, Rensselaer Polytechnic Institute, USA: "Wavelength-Stable Green Light Emitting Diodes in Non-Polar GaInN/GaN Quantum Well Growth"
• Chung-Lin Wu, National Cheng Kung University, Taiwan: "Cross-sectional scanning photoelectron microscopy/spectroscopy studies on the electronic structures of InN surface and interface"
• Tomohiro Yamaguchi, Ritsumeikan University, Japan: "Growth of InN and Related Alloys Using Droplet Elimination by Radical Beam Irradiation"
• Akio Yamamoto, Fukui University, Japan: "Recent Advances in InN-based Solar Cells; Status and Challenges in InGaN and InAlN Solar Cells"
• Akihiko Yoshikawa, Chiba University, Japan: "Recent advances and challenges in p-type doping of InN and InN-based novel nanostructures" 

Organisers

Dr. Filip Tuomisto, Department of Applied Physics, Helsinki University of Technology, Finland

Dr. Pierre Ruterana, CIMAP-ENSICAEN, Caen, France

Prof. Michael Kneissl, Institut für Festkörperphysik, Technische Universität Berlin, Germany

Prof. Yasushi Nanishi, Department of Photonics, School of Science and Engineering, Ritsumeikan University, Japan

Proceedings

The proceedings of this symposium will be published in physica status solidi (c), with selected papers in physica status solidi (a) and (b). All papers will be peer-reviewed.

The deadline for manuscript submission is September 7, 2009. Only on-line submission will be supported: go to http://conferences.wiley-vch.de and choose the proper journal (physica status solidi) and conference (E-MRS 2009 FM, Symposium A, author).

Please see the manuscript preparation guidelines at
http://www3.interscience.wiley.com/journal/122311674/grouphome/instruct-c08.html

General instructions for using the on-line submission can be found here.

Sponsors

The symposium is partially supported by the EU through the RAINBOW ITN Grant agreement N°: PITN-GA-2008-213238. Website: http://rainbow.ensicaen.fr

Contact

Filip Tuomisto

Department of Applied Physics, Helsinki University of Technology

P.O. Box 1100, FI-02015 TKK Espoo, Finland

Phone: +358-9-4513144

Fax: +358-9-4513116

e-mail: see http://fyslab.tkk.fi/personnel/Filip_Tuomisto.html