New Opportunities and Challenges in Material Research using Phonon and Vibrational Spectra
In the last two decades research in area of
lattice dynamic of solids developed an important methods of
characterization playing a pivotal role in characterization of
advanced materials at various dimensional and temporal scales. The
growing interest and high technological relevance of the vibrational
spectra research have been justified by using of new
experimental instruments as Fourier spectroscopy and new light
sources in infrared region as synchrotron radiation opened in
several great facilities both in Europe and worldwide.
This E-MRS Symposium is aimed to:
- give an overview of the current status of optical metrology in far-infrared region for materials characterization and quality assurance of mono-crystals and layer-structured materials as well as one-dimensional nanomaterials, with a particular emphasis on state-of-the-art metrology for defects and impurities detecting using vibrational spectra;- promote and encourage the interaction between academic and industrial research (instrument manufacture, IC and optoelectronics industry and materials suppliers) to address scientific and technological challenges associated with the improvement of standard analytical methods and qualification of newer techniques.
First we would like to highlight the trends and
advances in the techniques of optical metrology in far-infrared
region for monocrystals (mainly solid solutions), thin film
materials, nanowires and nanotubes and secondly, we will address the
application of such techniques to the study of real local crystalline
structure (character of basic cells distribution in lattice and
quantitative analyses of defects and impurities) in these materials.
As manufacturing processes become more complicated, it is imperative to employ in-situ metrology; this is particularly true in the microelectronics and micro-systems industry, such as compound semiconductor electronics, photonics, MEMS and sensors.
The current trends in optical metrology mainly concern Fourier spectroscopy and Raman spectroscopy applied to micro- and nanostructures: infrared microscopy and Raman microscopy. Both related techniques (Fourier and Raman) have gained considerable interest in the last decade and are currently involved in the characterization of nanomaterials. In this symposium, these methods will be discussed with particular attention paid to their application, as well as their limitations and complementarities.
- Trends and advances in optical far-infrared metrology for different monocrystaline and multilayer materials
- Recent development, using far-infrared Synchrotron sources for non-destructive characterization of thin-layered materials and of micrometer-sized (or smaller) objects.
- Spatially resolved techniques for the investigation of small objects and micro-devices using Infrared reflectivity and Raman scattering: infrared microscopy and Raman microscopy.
- Advances in numerical method-based procedures for far-infrared reflectivity data interpretation – Kramers-Kroning transformation, subtraction of plasma reflectivity.
- Vibrational modes in nanotubes.
- Phononics crystals.
- Characterization of III-N based materials using vibrational local modes.
- Characterization of hydrogenated materials local vibrational modes and additional phonon modes.
- Role of defects in vibrational and phonon spectra.
- Vibrational and phonon spectra of solid solutions: role of defects and impurities.- Interface and Confident modes as instrument of low-dimentional structures characterization.
Tentative list of invited speakers:
Proceedings will be published in special issue of phys. stat. sol. (c) part of contributions (of original character) in phys. stat. sol. (b).
Manuscript preparation instructions and Word/LaTeX templates
General author instructions with links to the template/style packages valid for pss (a), (b), and (c) are available at
You may link to this page directly from the conference/collaboration homepage.
Please to use either the Word or the LaTeX template, especially for publication in pss (c), since the articles will be produced from the publication-ready manuscript files. In addition, it is the easiest and most accurate way to check the page limits: 6 pages for invited talks and 4 pages for others contributions.