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Lauri Niinisto
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Affiliation:
Laboratory of Inorganic and Analytical Chemistry, Helsinki University of Technology, P.O. Box 6100, FIN-02015 Espoo
address:
, Helsinki, ,
Finland
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Participant:
E-MRS Fall Meeting 2003
began:
2003-09-15
ended:
2003-09-11
Presented:
E-MRS Fall Meeting 2003
Advanced electronic and optoelectronic materials by Atomic Layer Deposition: An overview with special emphasis on recent progress in processing of high-k dielectrics
Publications:
Advanced electronic and optoelectronic materials by Atomic Layer Deposition: An overview with special emphasis on recent progress in processing of high-k dielectrics
Atomic layer deposition as a tool for tailoring adhesion properties of interfaces.
Low temperature ZnMnO by ALD
ZnMnO Films grown by Atomic Layer Deposition with uniform Mn distribution
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