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Krystyna Golaszewska
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Affiliation:
Institute of Electron Technology
address:
al. Lotników 32/46, Warszawa, 02-668,
Poland
phone:
(4822)5487792
fax:
(4822)8470631
web:
http://www.neti.ite.waw.pl
Participant:
E-MRS Fall Meeting 2003
began:
2003-09-15
ended:
2003-09-11
Presented:
E-MRS Fall Meeting 2003
Study of Long-Term Stability of Ohmic Contacts to GaN
Participant:
Joint Fith International Conference on Solid State Crystals & Eighth Polish Conference on Crystal Growth
began:
2007-05-20
ended:
2007-05-24
Presented:
Joint Fith International Conference on Solid State Crystals & Eighth Polish Conference on Crystal Growth
Comparison of various GaSb-based device structures for application in thermophotovoltaic cells
Joint Fith International Conference on Solid State Crystals & Eighth Polish Conference on Crystal Growth
Photothermal investigations of SiC thermal properties
Joint Fith International Conference on Solid State Crystals & Eighth Polish Conference on Crystal Growth
Liquid phase growth and characterization of laterally overgrown GaSb epitaxial layers
Publications:
Characterization of Ir and IrO
2
Schottky contacts on n-type 4H-SiC under high temperature stress
Comparison of various GaSb-based device structures for application in thermophotovoltaic cells
Determination of stress in composite engineered substrates for GaN-based RF power devices
Diffusion barrier properties of reactively sputtered W-Ti-N thin films
Liquid phase growth and characterization of laterally overgrown GaSb epitaxial layers
MBE growth of GaN nanowires on Si(111) substrates for gas sensor applications
NANOCOMPOSITE PHOTONIC SENSORS: FIRST APPROACH BY THE NANOPHOS INITIATIVE
Optimisation of electrochemical sulphur treatment of GaSb and related semiconductors: application to surface passivation of GaSb/In(Al)GaAsSb TPV cells
Photothermal investigations of SiC thermal properties
p-type conducting ZnO: fabrication and characterisation
Study of Long-Term Stability of Ohmic Contacts to GaN
TaSiN, TiSiN and TiWN diffusion barriers for metallization systems to GaN
Thermally stable Ru-Si-O gate electrode for AlGaN/GaN HEMT
Transparent Conducting Oxides as Ohmic Contacts for GaSb-based Thermophotovoltaic Cells
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