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- Myoung-Gyun Ko
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phone:
+82-2-22200386
fax:
+82-2-22982850
web:
interest(s):
Affiliation:
Hanyang University
address:
14-509, Heangdang-Dong, Seong-dong-Gu, Seoul, 133-791,
Korea, South
phone:
+82-2-22200386
fax:
+82-2-22982850
web:
http://www.thinfilmlab.com
Participant:
E-MRS Fall Meeting 2007
began:
2007-09-17
ended:
2007-11-30
Presented:
E-MRS Fall Meeting 2007
Characterization of ruthenium titanium nitride thin films deposited by rf-direct plasma atomic layer deposition
E-MRS Fall Meeting 2007
A study for interface of ruthenium deposited by rf-direct plasma enhanced atomic layer deposition
Publications:
A study for interface of ruthenium deposited by rf-direct plasma enhanced atomic layer deposition
Characterization of ruthenium titanium nitride thin films deposited by rf-direct plasma atomic layer deposition
Plasma enhanced atomic layer deposition of titanium oxide passivation layers on polymer substrates
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