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Fabrication and characterization of SiC/Si heterojunction diode. |
Taupin Héloise 1, Philippe MARIE 1, Laurent PICHON 2, Richard RIZK 1 |
1. Laboratoire d'Eudes et de Recherches sur les MATériaux (LERMAT), bd Maréchal Juin, Caen 14050, France |
Abstract |
Thin silicon carbide films have been obtained by reactive magnetron sputtering at varius temperatures under hydrogen rich plasma. Infrared absorption spectroscopy measurements reveal a crystalline fraction that increases from about 40% to 80% when the deposition temperature is increased from 300 to 600C. X-ray diffraction measurements show evidence of SiC nanocrystals embedded in an amorphous matrix. Moreover, preliminary dark conductivity measurements show a transport property behavior that appears quite compatible with the evolution of the structural features. Finally, SiC/Si heterojunctions based on Sb-doped SiC layers were fabricated and characterized, showing a relatively high rectification behavior together with a low leakage current. |
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Presentation: poster at E-MRS Fall Meeting 2003, Symposium A, by Taupin HéloiseSee On-line Journal of E-MRS Fall Meeting 2003 Submitted: 2003-05-27 16:58 Revised: 2009-06-08 12:55 |