Titanium nitride and carbonitride are regarded as potential biomaterials for contact with soft tissue or blood. TiN and TiCN films were fabricated by PLD method with system working with a Nd:YAG laser onto three substrates i.e. Tiα, Ti6Al4V alloy and polycrystalline silicon. A transition (buffer) layer adjacent to the substrate was applied to improve adhesion of the coating. It comprises gradient nitride or carbonitride layers produced by application of controlled variation of reactive gaseous atmosphere in the chamber, by switching the gas flow from Ar to N₂ or C₂H₂. Atomic force microscopy (AFM) was used to examine morphology of the surface in three crucial stages of deposition process i.e. substrate before deposition, after deposition of transition (buffer) layer and after deposition of the final TiN or TiCN layer. Cross- section of the materials was examined by transmission electron microscopy (TEM) as well as by high resolution transmission electron microscopy (HRTEM) with selected area diffraction (Fourier transform) to study the buffer layer. The structure transformation from amorphous type, existing at the border between the substrate and the buffer layer, to crystallized one formed under the maximal nitrogen flow close to the surface was stated. Crystallographic X-ray texture tomography (XTT) in the near-the-surface area was performed for detection of texture variation in respect to the reactive gas flow. Residual stress measurements on the basis of the X-ray method (sin²Ψ) were performed for the deposited films. Biological examinations were performed on human fibroblast cells in 48h culture. Fibronectin expression was investigated with application of the confocal microscopy.

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