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Grain orientation-location measurement by combined use of x-ray topography with diffractometry

J.M. Yi 2J.H. Je 2Y.S. Chu 1H. You 1W. G. Cullen 1,3

1. Argonne National Laboratory (ANL), 9700 South Cass Avenue, Argonne, IL 60439, United States
2. Pohang University of Science and Technology (POSTECH), San 31, Hoyja-dong, Nam-gu, Pohang 790-784, Korea, South
3. University of Maryland, College Park, MD, United States


Nondestructive probe with sensitivity to both orientation and location of individual grain has been strongly required due to the importance of local microstructure in studying structural dynamics of a material or its physical properties.
We developed a new x-ray diffraction microscopy technique capable of coupling grain orientation with its spatial location in textured materials. The grain orientation-location measurement is based on angular-resolved orientation contrast by combined use of x-ray topography with x-ray diffractometry using monochromatic, collimated x-rays.
By applying it to Y2O3/Ni, we demonstrated the capability of grain orientation-location measurement for the textured materials. Its useful applicability for local microstructural analysis was also demonstrated with the observation of the grain-on-grain microstructural correlation between the Y2O3 film grains and the Ni substrate grains. As a result, we found that on surface orientated Ni grains, Y2O3 film grains preferred growing along the crystallographic direction of the Ni(002) grains. On the contrary, on large misoriented Ni grains, Y2O3 grains grew along the surface direction rather than the crystallographic direction of the Ni(002) grains. This result indicates the possibility of different growth mechanisms of Y2O3 film grain, depending on misorientation of substrate Ni grain. This technique is expected to contribute further to understanding of mesoscale phenomena such as phase transformation and plastic deformation of textured materials.


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Presentation: poster at E-MRS Fall Meeting 2004, Symposium D, by J.M. Yi
See On-line Journal of E-MRS Fall Meeting 2004

Submitted: 2004-06-21 15:20
Revised:   2009-06-08 12:55