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Growth of non-polar (10.0) ZnO thin films on MgO (100) using rf-magnetron sputtering

Marco Peres 1Sergio Pereira 2Maria R. Correia 1Armando C. Lourenço 2Teresa Monteiro 1

1. Universidade de Aveiro, Departamento de Física, INNN, Aveiro, Aveiro 3810-193, Portugal
2. Universidade de Aveiro, Departamento de Fisica and CICECO (UA), Campus de Santiago, Aveiro 3810-193, Portugal


We report the deposition and growth of m-plane non-polar (10.0) ZnO oriented thin films on MgO (100) substrates using the rf-magnetron sputtering technique. The key parameters temperature, oxygen partial pressure and substrate/film lattice mismatch must be combined to yield a preferred growth orientation. HRXRD and AFM microscopy reveals macroscopic single domain structures with 13º rotations relative to the substrate due to in-plane MgO [011] alignment with the ZnO [01.1]. PL emission and Raman spectroscopy were the techniques used for thin film optical characterization.


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Presentation: Poster at E-MRS Fall Meeting 2009, Symposium C, by Marco Peres
See On-line Journal of E-MRS Fall Meeting 2009

Submitted: 2009-05-25 21:09
Revised:   2009-06-19 16:55