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Magnetic field analysis for magnetron sputtering apparatus for accurate composition control
|Yutaka Sakurai 1, Hiroko Nakamura 2, Ryo Nakajima 3
1. Toyama National College of Technology, 13 Hongo, Toyama 939-8630, Japan
Authors use magnetron sputtering technique for controlling the film composition by modifying the magnetic field with an external solenoid in addition to the magnetic field with a permanent magnet on the back of the composite target. It is necessary to understand the contribution of the solenoid quantitatively for the effective application of this technique. The magnetic field on the target was calculated by the finite element method (FEM), and correspondence with the erosion region was discussed.
Presentation: Poster at E-MRS Fall Meeting 2008, Symposium C, by Yutaka Sakurai
See On-line Journal of E-MRS Fall Meeting 2008
Submitted: 2008-05-19 16:45 Revised: 2009-06-07 00:48