Search for content and authors
 

Development of a hybrid PECVD/PVD process for nanocomposite thin films synthesis: application to copper-silica layers

Alain Daniel 1Christophe Le pen 1François Reniers 2

1. ARCELORMITTAL Liege research and development, Bd de colonster, B57, Liège 4000, Belgium
2. Université Libre de Bruxelles, Analytical and Interfacial Chemistry (ULB), Boulevard du Triomphe, Brussels 1050, Belgium

Abstract

Nanocomposite coatings offer a wide range of functionalities for steel industry: aesthetic, superhardness, low friction coefficient, anticorrosion, self-healing, optical filters, hydrophilicity, … Sol-gel techniques are often used to obtain this kind of materials.

Here a hybrid process which combines Plasma Enhanced Chemical Vapour Deposition (PECVD) and sputtering  is developed to produce nanocomposite thin films on steel. The work describes the synthesis of layers based on a silica matrix and copper oxide clusters. The influence of some process parameters on the coating composition, such as the precursor flowrate and the power, is evaluated.

This work shows that by using the hybrid process it is possible to manage the quantity of sputtered metal inside a silica-like matrix from a copper or copper oxide film to a pure organosilicon matrix. The thin films are characterized by SEM, X-Ray Fluorescence, X-Ray Diffraction and FTIR measurements.

The process flexibility  could allow us to develop various silica based coatings just by replacing the metallic target with the appropriate one.

 

Legal notice
  • Legal notice:
 

Related papers

Presentation: Oral at E-MRS Fall Meeting 2008, Workshop, by Alain Daniel
See On-line Journal of E-MRS Fall Meeting 2008

Submitted: 2008-05-19 11:15
Revised:   2009-06-07 00:48