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Development of a hybrid PECVD/PVD process for nanocomposite thin films synthesis: application to copper-silica layers |
Alain Daniel 1, Christophe Le pen 1, François Reniers 2 |
1. ARCELORMITTAL Liege research and development, Bd de colonster, B57, Liège 4000, Belgium |
Abstract |
Nanocomposite coatings offer a wide range of functionalities for steel industry: aesthetic, superhardness, low friction coefficient, anticorrosion, self-healing, optical filters, hydrophilicity, … Sol-gel techniques are often used to obtain this kind of materials. Here a hybrid process which combines Plasma Enhanced Chemical Vapour Deposition (PECVD) and sputtering is developed to produce nanocomposite thin films on steel. The work describes the synthesis of layers based on a silica matrix and copper oxide clusters. The influence of some process parameters on the coating composition, such as the precursor flowrate and the power, is evaluated. This work shows that by using the hybrid process it is possible to manage the quantity of sputtered metal inside a silica-like matrix from a copper or copper oxide film to a pure organosilicon matrix. The thin films are characterized by SEM, X-Ray Fluorescence, X-Ray Diffraction and FTIR measurements. The process flexibility could allow us to develop various silica based coatings just by replacing the metallic target with the appropriate one. |
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Presentation: Oral at E-MRS Fall Meeting 2008, Workshop, by Alain DanielSee On-line Journal of E-MRS Fall Meeting 2008 Submitted: 2008-05-19 11:15 Revised: 2009-06-07 00:48 |