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Failure Analysis of Microelectronic Packages by Pulse IR Thermography |
Bernhard Wunderle , Daniel May , Ralph Schacht , Bernd Michel |
Fraunhofer IZM (IZM), Gustav-Meyer-Allee 25, Berlin 13355, Germany |
Abstract |
Pulse IR thermography has been used for the detection of hidden flaws and cracks in macroscopic structures (e.g. turbine blades, propellers) for several years, but as IR cameras are becoming increasingly refined in their time, space and temperature resolution capabilities it is possible to transfer the method on to failure detection in microelectronic devices. It has been successfully employed for short circuit analysis in integrated circuits or for detection of voids and delaminations in BEOL and packaging materials and interconnects. The measurement principle is hereby always the same: The structure under test is excited by a transient thermal pulse before its thermal response over time is recorded by the IR camera. Different excitation modes exist to impart the energy pulse to the structure: One distinguishes between electrical, flashlight, laser-flash, eddy-current, ultrasonic and IR-beam excitation mode, where the method of choice depends on the structures on component, board or system level. The signal-to-noise ratio can be enhanced considerably by using a lock-in amplifier, allowing the detection of very small temperature differences generated actively or indirectly by the defects in the structure. |
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Presentation: Oral at HITEN 2007, by Bernhard WunderleSee On-line Journal of HITEN 2007 Submitted: 2007-07-11 20:44 Revised: 2009-06-07 00:44 |