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X-ray photoelectron spectroscopy for surface and thin film chemical analysis.

Antonella Rossi 

University of Cagliari, Campus of Monserrato, Cagliari 09100, Italy
ETH Zurich, Sonneggstrasse 3, Zurich 8092, Switzerland

Abstract

The chemical composition of the surface of a material mostly differs significantly from the bulk or average composition due to adsorption, oxidation and dissolution reactions. This typically occurs in situations such as catalysis, tribology and corrosion. On the other hand the functionalization of metal and metal oxide surfaces with adsorbed molecules is nowadays an attractive technique to form well-adherent molecular layers at the interface. This method might allow the production of tailor-made materials with controlled surface properties.
A technique considered essential for the understanding both the film growth and properties of nanosized films is x-ray photoelectron spectroscopy. It allows not only the identification of all elements present on the surfaces but also their speciation via the chemical shift of the elements belonging to the various functional groups. Quantitative analysis allows determination of the thickness and the composition of the overlayer and of the substrate. The rapid development of new spectrometers together with the possibility of applying new algorithms for data processing and quantification results in non-destructive in-depth profiles of thin films. Imaging – XPS can provide high lateral resolution chemical information. Some recent examples as e.g. self-assembled monolayers on gold, the oxidation of iron and nano-crystalline NiP alloys and the characterization of nano-biofilms will be presented.

 

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Presentation: Invited at E-MRS Fall Meeting 2007, Symposium J, by Antonella Rossi
See On-line Journal of E-MRS Fall Meeting 2007

Submitted: 2007-05-28 17:55
Revised:   2009-06-07 00:44