Spectroscopic Ellipsometry (SE) is routinely used to measure thickness and optical constants of dielectric and semiconductor films. However, it is difficult to insure unique results for thin absorbing films, such as metals. SE methods to enable simultaneous determination of metal layer thickness and optical constants include multiple sample analysis, interference enhancement, optical constant parameterization, and simultaneous analysis of SE and intensity-based optical measurements. Methods are tested on a series of Chromium thin films prepared with multiple thicknesses and multiple substrate types to allow direct comparison between methods.

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