It is observed that the surface roughness varies non-monotonously with different deposition parameters. The aim of this work is to analyze and explain the non-monotonous dependencies of the surface roughness on the substrate temperature and on the deposition flux. For this purpose the kinetic model has been proposed. The proposed kinetic model is based on the rate equations and includes various steps (surface diffusion of adsorbed atoms, nucleation, growth and coalescence of the islands) of island film growth. Analysis of experimental results done by modeling explains non-monotonous dependencies of surface roughness on the substrate temperature and deposition flux which is resulted by size of the islands and diffusivity of adatoms.

Keywords: surface roughness; island films deposition; surface diffusion; kinetic modeling

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