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The optimalization of the registration condition for the X-ray reflectivity of real multilayer thin films

Bożena B. Bierska-Piech 1Dariusz Chocyk 

1. University of Silesia, Institute of Physics and Chemistry of Metals, Bankowa 12, Katowice 40-007, Poland

Abstract

The X-ray reflectivity method is the useful tool for the determination of parameters describing thin- and multilayer film as: thickness (τ - the range from 10 to 2000Å), density (ρ) and roughness (σ). The Cu, Au, Ag real multilayer films with different thickness, have been obtained by vacuum evaporation technique on silicon subtract, was analyzed under different registration condition.

Moreover, the Grazing Incident X-ray Diffraction Geometry (GIXD) method was applied for different incident angles for structure determination of the real multilayer thin films.

The measurements were performed by using the Philips X’PERT diffractometer. The calculations of the characteristic parameters of reflectivity data were carried out by the WINGIXA and SUPREX software. The standard X’PERT software was applied for the determination the characteristic parameters of Grazing Incident X-ray Diffraction Geometry (GIXD) method.

 

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Related papers

Presentation: Poster at E-MRS Fall Meeting 2007, Symposium H, by Bożena B. Bierska-Piech
See On-line Journal of E-MRS Fall Meeting 2007

Submitted: 2007-05-11 16:40
Revised:   2009-06-07 00:44