Titanium dioxide nanostructured thin layers were deposited by different methods and compared functionally for the use in photo electrochemical cells. Both plasma (DC magnetron spattering and laser ablation) and chemical (spin coating from titanium butoxide) deposition were used. Commercially available ITO on glass or on alumina silicate glass were used as substrates. Scanning electron microscopy, X-ray diffraction and positron annihilation were used for structural analysis. As far as the chemical method needed several steps to obtain about 0.5 micron layers, magnetron spattering with carefully chosen parameters produces such layers in a single step. Layers were used vs. platinum electrode in distilled water to determine photo electrochemical potentials. Essentially, the potentials obtained were only slightly dependent on the deposition method but photo electrochemical currents much more. No significant influence of the titanium dioxide phase (anatase vs. rutile) on the functional features was observed. Instead, the morphological structure influences much fixing of dyes on the titanium dioxide surface.

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