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Interdiffusion in Au-Ni Micro- and Nanolayers
|Marek Danielewski 2, Robert Filipek 2, Anna Rakowska 2, Krzysztof Sikorski 1|
1. Warsaw University of Technology, Faculty of Materials Science and Engineering (InMat), Wołoska 141, Warszawa 02-507, Poland
Interdiffusion in nano- and micro- (500nm - 60μm) Au-Ni layers deposited on different substrates is studied using EDS X-Ray technique. Quantitative X-ray microanalysis was applied and intensities of the characteristic X-ray lines (NiKα, AuMα, SiKα and WMα) were measured up to 30 kV accelerating voltage. Thin layers (500 nm) were analyzed by electron beam perpendicular to their surface. The mean concentration of these elements in each layer were calculated using CAMECA correction program XTFML based on the Pouchou and Pichoir method (PAP) for in-depth analysis of multilayer samples. Bulk layers (up to 60 μm) were investigated on their cross-sections using standard EDS technique with ZAF-4 correction.
Presentation: oral at E-MRS Fall Meeting 2003, Symposium G, by Marek Danielewski
See On-line Journal of E-MRS Fall Meeting 2003
Submitted: 2003-06-18 18:38 Revised: 2009-06-08 12:55