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dr Keiko Masumoto
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+81-29-8614165
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+81-29-8615434
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Affiliation:
National Institute of Advanced Industrial Science and Technology
address:
Tsukuba central 2, Ibaraki, 305-8568,
Japan
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Participant:
17th International Conference on Crystal Growth and Epitaxy - ICCGE-17
began:
2013-08-11
ended:
2013-08-16
Presented:
17th International Conference on Crystal Growth and Epitaxy - ICCGE-17
Suppression of step bunching generated on 4H-SiC Si-face substrates with vicinal off-angle
Publications:
C-face epitaxial growth of 4H-SiC on quasi-150mm-diameter wafers
Suppression of step bunching generated on 4H-SiC Si-face substrates with vicinal off-angle
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