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dr Hitoshi Habuka

e-mail:
phone: +81-45-3393998
fax: +81-45-3393998
web:
interest(s):

Affiliation:

Yokohama National University

address: 79-5 Tokiwadai Hodogaya, Yokohama, 240-8501, Japan
phone: +81-45-3393998
fax: +81-45-3393998
web:

Participant:

17th International Conference on Crystal Growth and Epitaxy - ICCGE-17

began: 2013-08-11
ended: 2013-08-16
Presented:
17th International Conference on Crystal Growth and Epitaxy - ICCGE-17
Method for determining chemical vapor deposition occurrence using langasite crystal microbalance
17th International Conference on Crystal Growth and Epitaxy - ICCGE-17
Low Temperature Amorphous Silicon Carbide Thin Film Formation Process on Aluminum Surface Using Monomethylsilane Gas and Trichlorosilane Gas

Publications:
  1. Low Temperature Amorphous Silicon Carbide Thin Film Formation Process on Aluminum Surface Using Monomethylsilane Gas and Trichlorosilane Gas
  2. Method for determining chemical vapor deposition occurrence using langasite crystal microbalance



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