We shall start with a brief review of the principles of the Doppler Broadening of the positron annihilation radiation line, the technique most frequently used in defect depth profiling in solids and relevant to dc-beams. We will then focus on some specific examples of Slow Positron Implantation Spectroscopy (SPIS) investigations related to technological applications such as i) the sub-surface damage production by ion implantation in metals or ceramics, ii) the phase transition in tungsten coatings possibly induced by internal stresses, and iii) the dependence on substrate preparation of defect profiles in deposited layers. We will try to elaborate on the possibility of deriving some criteria from SPIS results in order to assess adhesion in metal/polymer or polymer/metal couples.

• Legal notice:
  

  Copyright (c) Pielaszek Research, all rights reserved.
  The above materials, including auxiliary resources, are subject to Publisher's copyright and the Author(s) intellectual rights. Without limiting Author(s) rights under respective Copyright Transfer Agreement, no part of the above documents may be reproduced without the express written permission of Pielaszek Research, the Publisher. Express permission from the Author(s) is required to use the above materials for academic purposes, such as lectures or scientific presentations.
  In every case, proper references including Author(s) name(s) and URL of this webpage: https://science24.com/paper/8713 must be provided.