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Characterization of Thin-Layer Materials by Auger Electron Spectroscopy (AES) Combined with Ion Etching |
Marcin Pisarek |
Warsaw University of Technology, Faculty of Materials Science and Engineering (InMat), Wołoska 141, Warszawa 02-507, Poland |
Abstract |
Studies of the chemical and physical nature of passive oxide films formed on metals and alloys is a central subject of corrosion research. Passive oxide layers, typically 2-5 nm in thickness, protect many metals and alloys from an aggressive influence of the corrosion environment. Most of present knowledge on the chemical composition of passive films comes from ex-situ surface analytical methods. In particular AES (Auger Electron Spectroscopy) technique provide fundamental information on the chemical composition and state of components of thin surface layers, and particularly on surface atoms. AES is closely related technique which involve the energy of electrons emitted from small depth (several atomic layers) at the surface of a material. These fundamental information ensured the usefulness of AES for practical surface analysis. The composition surface layers is often quite different from that of the bulk material due to contamination, oxidation, or technological processing. This method give an insight into important problem concerning nature of passive films / oxide layer. Notable they provide an answer to the following question: |
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Presentation: Oral at E-MRS Fall Meeting 2006, Thin-layered materials workshop, by Marcin PisarekSee On-line Journal of E-MRS Fall Meeting 2006 Submitted: 2006-08-04 17:54 Revised: 2006-08-08 13:13 |