Thin film deposition by CVD techniques plays a dominant role in the development of both protective and functional coatings, important for their technological implications. Commonly, multi-component materials are prepared from a mixture of precursors; however the efficiency of such processes is hampered by the mis-match of chemical reactivity such as thermal stability; vapour pressure etc. among the precursor species. As a consequence, phase separation and elemental segregation is commonly observed in CVD deposited materials.

The de-mixing of elements in multi-component systems is thermodynamically driven and sensitive to the chemical behaviour of the precursors. Transformation of precursor compounds possessing bonding features inherent to the solid-state lowers the need of diffusion and counterbalances the thermodynamic impediments. Recently, we have designed several new metal-organic systems and demonstrated their suitability to deposit corrosion-resistant and bio-compatible coatings on metallic and non-metallic substrates.

In addition, this talk will address the role of precursor chemistry in plasma-assisted deposition of nanostructured coatings.

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1. Functional Nanostructured Coatings by Molecule-based PECVD Techniques
2. Ferromagnetic Nanostructures by Atomic Layer Deposition: From Thin Films towards Core-shell Nanotubes