Pulse Magnetron Sputtering proves its versatility and capability in the production of high quality coatings on 3D-parts of various functions. It is a high-rate deposition technique for films of excellent properties, especially from dielectric materials. Examples of actual state-of-the-art functional coatings deposited by pulse magnetron sputtering will be presented, which are nanocomposite oxide and nitride coatings.

For the deposition of nanocomposite coatings, reactive co-sputtering of different target materials allows a fine adjustment of the film composition to generate the specific two-phase structures that exhibit outstanding mechanical properties. In this way, nc-ZrN/Al, and nc-Al₂O₃/ZrO₂ have systematically been generated with generally good adhesion and maximum hardness in the order of 30 GPa in both systems. In the nitride system Zr-Al-N, structure-related hardness increase is achieved for a small fraction of aluminium in the coating. In the oxide system Al-Zr-O, depending on the composition, crystalline phases of g-alumina or tetragonal zirconia can be stabilised.

Another oxidic nanocomposite system attracting much interest is the system nc-TiO₂/Ti, where crystallites of TiO₂ are embedded in a Ti-matrix. Pulse Magnetron Sputtering allows the tailored generation of anatase or rutile phase through the choice of pulse parameters and deposition conditions. Properties like hydrophilicity and photocatalytic activity are investigated as a function of crystalline phase formation and stoichiometry in the nc-TiO₂/Ti system.

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