In recently years hydrogen has been attracting attention as a clean energy. For its storage, as a tank for liquid hydrogen Al-Mg alloy has been chosen. Hydrogen is throught to permeate most metallic materials and causes hydrogen embrittlement. Therefore in the present examination the Al-Mg thin films has been made using pulsed laser deposition (PLD) technique. The Al-Mg alloy was employed as a target (substrate). The thin films have been deposited on silicon and glass wafers at room temperature. In the investigations have been used the scanning electron microscope and the transmission electron microscope. After pulsed laser deposition observed the changes of the microsturctures, the chemical composition and the thin films have been characterized using X-ray diffraction. The microstructure of the deposited thin films especially depended on the exposure time.

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