Amorphous alloys of CoFe-rich magnetic amorphous films are well known as typical soft magnetic alloys. They are used for many kinds of electric and electronic parts such as magnetic recording heads, transformers and inductors. In order to get superior soft magnetic properties of the CoFe-based nanocrystalline thin films, the Co-Fe-Hf-O nanocrystalline thin films have been investigated. The soft magnetic properties and electrical property of these films show a dependence on the partial pressure of reactive gases, which presumably changes the microstructure of the films and related magnetic anisotropy. After optimum of pressure O₂, these films exhibit excellent soft-magnetic properties: saturation magnetization (4pM_s) of 29 kG, magnetic coercivity (H_c) of 0.02-1Oe, anisotropy field (H_k) of 50-70 Oe, and an electrical property is also shown to be as high as 900 mWcm. The combination of high 4pM_s and relatively high H_k in these films are believed to be partly responsible for the excellent ultra-high-frequency behavior.

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