Surface morphology is a key parameter for an effective light trapping schme in thin film solar cells. MetalOrganic Chemical Vapor Deposition (MOCVD) is a fast and flexible method that allows the deposition of transparent conductive oxides with custmized electrical, optical and morphological features. The control of film properties is done by properly tuning the deposition temperature and pressure, the total gas flow and the ratio between the flows of the precursor gases.

In this study we present non-intentionally doped Zinc Oxide films deposited using water and diethylzinc as gas precursors. The influence of the ratio between the flows of water and diethylzinc is analyzed by means of Hall effect measurements, Scanning Electron Microscope (SEM) and X-Ray Diffraction (XRD).We show how by increasing the water/diethylzinc ratio, the surface morphology varies from wedges (2 sides) to pyramids (3 sides). Finally a tentative growth model according to XRD measurements is proposed.

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