Ag modified thin films were grown by sputtering method using sintered Ag/TiO₂ target. Sputtered films were deposited on glass at room temperature. After sputtering samples were heated at different temperatures and time in order to stabilize structure. Microstructural properties were examined using X-ray diffraction (XRD) and Field emission Scanning Electronic Microscope (FESEM). X-Ray photoelectron spectrophotometer (XPS) was used to analyze chemical composition and stoichiometry of doped thin films. Photocatalytic properties were examined by liquid phase photodegradation of organic dyes under visible and UV light. Bandgap energy of doped films was determined using UV-visible absorbance spectrophotometer. It was found that photocatalytic activity depends on morphology and thickness of deposited film. In this study optimum sputtering parameters for achieving the highest phocatalytic properties of doped films were determined. 

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