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Panel discussion on the future of radiation sensors and detectors in European research and industry |
Heinz Graafsma 1, Erik Heijne 2, John Morse 3 |
1. Europen Synchrotron Radiation Facility (ESRF), 6, Jules Horowitz, Grenoble 38000, France |
Abstract |
With the current developments in micro-electronics and interconnect technologies new and exciting possibilities exists for developing revolutionary new sensors for radiation imaging. The deep sub-micron CMOS technologies (0.13 micron or 0.09 micron) allow one to integrate many signal processing steps into small cells (pixels), resulting in intelligent pixel array sensors. At the same time, new developments in interconnect technologies, driven by the packaging industry (mobile phones for example), allow for the development of stacked modules. The combination of these two developments can provide highly integrated and intelligent sensors. Therefore, the technology is potentially available. Whether, these technologies will also be available for the scientific community is uncertain, simply because of the exponential increase in development costs. Europe has traditionally had a world leading position in "sensor" development, in part due to large scale scientific projects like CERN. To keep this world leading position European research, will have to work together with European industry and European policy makers and funding agencies.
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Presentation: oral at E-MRS Fall Meeting 2004, Symposium D, by Heinz GraafsmaSee On-line Journal of E-MRS Fall Meeting 2004 Submitted: 2004-07-25 13:29 Revised: 2009-06-08 12:55 |