Nanodevice fabrication requires structuring techniques that, in an economically attractive way, can generate high-resolution features. Direct writing techniques, like electron- and ion-beam lithography, are slow and require very expensive machines.  Hence, they are mostly used for nanodevice development. These techniques need scaling up by introducing the concept of massive parallel beams as is the case for CHARPAN (Charged Particle Nanopatterning) using 43-thousand programmable ion beams of 12.5nm beam size.

In this presentation, the EUMINAfab nano-lithography competences on electron-beam lithography, ion multi- beam lithography and imprint lithography are highlighted. Structuring of 15 nm wide Ag antennas is shown as an example of electron-beam lithography cobined with either lift-off or dry etching technology. Further, SCIL (Substrate Conformal Imprint Lithography) is presented as a commercially successful case of large-area replication technology in the field of fabrication of gratings for VCSELs. Finally, the ultra-high resolution capabilities of CHARPAN are demonstrated as direct write tool (12.5 nm half pitch lines and dot arrays) and in combination with SCIL, achieving 20nm 1:1 lines&spaces.

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3. Integration Technologies for Single-Crystalline NiMnGa Films
4. A Magnetization- and Strain-Dependent Free Energy Model for FEM Simulation of Magnetic Shape Memory Alloys
5. NiMnGa nanostructures produced by electron beam lithography and argon ion etching
6. Residual stress in Ni-Mn-Ga thin films deposited on different substrates
7. A Free Energy model for Magneto-Mechanically Coupled NiMnGa Single Crystals
8. Texture and Stress in Ni-Mn-Ga Thin Films Deposited on Alumina
9. Properties of martensitic Ni-Mn-Ga thin films deposited on Mo foils
10. MAGNETORESISTANCE OF Ni-Mn-Ga THIN FILMS IN THE VICINITY OF MAGNETOSTRUCTURAL TRANSFORMATION
11. Magnetomechanical Properties of Polycrystalline Ni-Mn-Ga Thin Film Actuators
12. Ferromagnetic Shape Memory Microscanner with Large Deflection Angles
13. PROPERTIES OF SPUTTER-DEPOSITED Ni-Mn-Ga THIN FILMS
14. DEPENDENCE OF THE MAGNETIC ANISOTROPY ON THE THICKNESS AND ANNEALING OF SPUTTER-DEPOSITED Ni-Mn-Ga THIN FILMS
15. Coupled simulation of the thermo-magneto-mechanical properties of a Ni-Mn-Ga actuator
16. Ferromagnetic Shape Memory Microscanner System for Automotive Applications