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Permiability of Deuterium in TiN films

Motonori Tamura 1Tadahiko Mizono 2Yutaka Hibino 3

1. The Japan Research and Development Center for Metals (JRCM), 1-5-11 Nishishinbashi, Minato-ku, Tokyo 105-0003, Japan
2. Hokkaido University, Sapporo 060-8628, Japan
3. Ion Engineering Research Institute Corporation, Osaka 573-0128, Japan

Abstract

Permiability of Deuterium in thin films was measured. TiN, DLC and Aluminum films were deposited on stainless steels by sputtering and ion plating. The effect of temperature, thickness of films, and chemical composition of films on the permiability of Deuterium was studied. Low permiation of Deuterium in TiN films was observed.

 

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Presentation: poster at E-MRS Fall Meeting 2004, Symposium I, by Motonori Tamura
See On-line Journal of E-MRS Fall Meeting 2004

Submitted: 2004-05-27 02:39
Revised:   2009-06-08 12:55